Science and Technology Foresight ›› 2025, Vol. 4 ›› Issue (1): 28-35.DOI: 10.3981/j.issn.2097-0781.2025.01.003

• Review and Commentary • Previous Articles     Next Articles

Development Status and Prospects of Ultra-wide Bandgap Semiconductor Materials

ZHAO Lubing(), WU Ling   

  1. China Advanced Semiconductor Industry Innovation Alliance, Beijing 100083, China
  • Received:2024-12-23 Revised:2025-02-20 Online:2025-03-20 Published:2025-03-27

超宽禁带半导体材料发展现状与展望

赵璐冰(), 吴玲   

  1. 第三代半导体产业技术创新战略联盟,北京 100083
  • 作者简介:赵璐冰,副研究员。第三代半导体产业技术创新战略联盟副秘书长。主要从事第三代半导体产业技术、国家科技规划编制、新型研发机构组建、产学研协同创新、科技成果孵化转化等。电子信箱:zhaolb@china-led.net

Abstract:

This paper analyzed the main characteristics and strategic requirements of ultra-wide bandgap semiconductor materials represented by diamond, gallium oxide, aluminum nitride, etc. and systematically reviewed the main technologies and industrial developments of ultra-wide bandgap semiconductor materials in China and abroad. It proposed key technical issues that need to be overcome and development suggestions and provided references for the future development of ultra-wide bandgap semiconductor materials in China.

Key words: diamond, gallium oxide, aluminum nitride, ultra-wide bandgap semiconductor

摘要:

文章分析了以金刚石、氧化镓、氮化铝等为代表的超宽禁带半导体材料的主要特点及战略需求,系统梳理了国内外超宽禁带半导体材料的主要技术和产业进展,提出了当前待突破的关键技术问题和发展建议,以期为后续中国超宽禁带半导体材料的发展提供参考。

关键词: 金刚石, 氧化镓, 氮化铝, 超宽禁带半导体